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UN2000A-BW

Heat-wet scrubber compatible with semiconductor

Gas Processing
HEAT WET
Processing Capacity
300LPM
Dimension
(Cabinet)
850(W)X900(D)X1750(H)
Product Features
Dry System: Minimize moisture release
Process flammable and water-soluble gas using the high-temperature heater
Low operating cost compared to burn or plasma type
Compatible Gas
PFC GAS : NF3
Flammable Gas : SiH4, DCS, TEOS, H2, PH3, ETC
Water-soluble Gas : Cl2, HF, HCl, NH3, ETC
Inquire

MAGMA1000

Heat-wet scrubber compatible with semiconductors and displays

Gas Processing
HEAT WET
Processing Capacity
600LPM
Dimension
(Cabinet)
800(W)X1150(D)X1600(H)
Product Features
Large-capacity processing facility appropriate for display CVD process
Process flammable and water-soluble gas using the high-temperature heater
Low operating cost compared to burn or plasma type
Compatible Gas
PFC GAS : NF3
Flammable Gas : PH3, ETC
Water-soluble Gas : Cl2, HF, HCl, NH3, ETC
Inquire

MAGMA3000

High-capacity heat-wet scrubber compatible with LED and LCD

Gas Processing
HEAT WET
Processing Capacity
1500LPM
Dimension
(Cabinet)
1280(W)X1300(D)X1850(H)
Product Features
Large-capacity processing facility appropriate for display CVD process
Process flammable and water-soluble gas using the high-temperature heater
Low operating cost compared to burn or plasma type
Compatible Gas
PFC GAS : NF3
Flammable Gas : SiH4, DCS, TEOS, H2, PH3, ETC
Water-soluble Gas : Cl2, HF, HCl, NH3, ETC
Inquire