ATOM 1000
Plasma-wet scrubber compatible with semiconductor
- Gas Processing
- PLASMA WET
- Processing Capacity
- 300LPM
- Dimension
(Cabinet)
- 800(W)X800(D)X1720(H)
- Product Features
-
High-temperature thermal equilibrium plasma
High decomposition efficiency for PFC gas (99%)
PFC gas processing equipment using high-temperature plasma ARC,
without using a secondary heat source (LNG, LPG, etc.)
- Compatible Gas
-
PFC GAS : NF3, SF6, CF4, C2F6, C3F8, ETC
Flammable Gas : SiH4, DCS, TEOS, H2, PH3, ETC
Water-soluble Gas : Cl2, HF, HCl, NH3, ETC
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